The conduction and valence band tunneling currents in ultrathin SiO2 films are studied. The slopes of the current–voltage characteristic agree well with the simulations performed. Conduction band current oscillations due to interference of the electrons from the inversion channel at the oxide/gate interface are observed. The shape of the slope of the valence band current in Fowler–Nordheim regime can be explained by the interference of the valence band electron wave at the oxide/gate interface. © 1999 American Institute of Physics.
Published in:
Applied Physics Letters
(Volume:74
,
Issue:
6
)
Date of Publication:
Feb 1999
- Page(s):
-
842
-
843
- ISSN :
-
0003-6951
- Digital Object Identifier :
-
10.1063/1.123385
- Product Type:
-
Journals & Magazines
- Date of Current Version :
-
18 June 2009
- Issue Date :
-
Feb 1999