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Two-band tunneling currents in metal-oxide-semiconductor capacitors at the transition from direct to Fowler–Nordheim tunneling regime

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5 Author(s)
Okhonin, S. ; Institute for Micro- and Optoelectronics and Electronics Laboratory LEG, Swiss Federal Institute of Technology, CH 1015 Lausanne, Switzerland ; Fazan, P. ; Guegan, G. ; Deleonibus, S.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.123385 

The conduction and valence band tunneling currents in ultrathin SiO2 films are studied. The slopes of the current–voltage characteristic agree well with the simulations performed. Conduction band current oscillations due to interference of the electrons from the inversion channel at the oxide/gate interface are observed. The shape of the slope of the valence band current in Fowler–Nordheim regime can be explained by the interference of the valence band electron wave at the oxide/gate interface. © 1999 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:74 ,  Issue: 6 )

Date of Publication: Feb 1999

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