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Browse Journals & Magazines > Applied Physics Letters ...> Volume:74 Issue:3 Help

Erratum: “Microscopic characterization of hot-electron spreading and trapping in SiO2 films using ballistic electron emission microscopy” [Appl. Phys. Lett. 73, 1871 (1998)]

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4 Author(s)
Kaczer, B. ; Department of Physics, The Ohio State University, Columbus, Ohio 43210 ; Im, H.-J. ; Pelz, J.P. ; Wallace, R.M.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.123041 

First Page of the Article

Published in:
Applied Physics Letters  (Volume:74 ,  Issue: 3 )

Date of Publication: Jan 1999

Page(s):
478
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.123041
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Jan 1999

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