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Step-flow growth of SrTiO3 thin films with a dielectric constant exceeding 104

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7 Author(s)
Lippmaa, M. ; Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8502, Japan ; Nakagawa, N. ; Kawasaki, M. ; Ohashi, S.
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The use of SrTiO3 films in cryogenic high-frequency applications has been limited by the low dielectric constant Єr of thin films (≈103) when compared to the bulk value of over 104. We show that the extension of the pulsed laser deposition technique to temperatures well above 1000 °C, coupled with in situ reflection high energy electron diffraction monitoring, makes it possible to grow SrTiO3 films in the step-flow mode. Films grown in this mode showed at 4.2 K a maximum Єr of 12 700, which could be tuned by 80% by applying a bias voltage of ±1 V. © 1999 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:74 ,  Issue: 23 )