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The influence of diffusion temperature and ion dose on proximity gettering of platinum in silicon implanted with alpha particles at low doses

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6 Author(s)
Schmidt, D.C. ; Royal Institute of Technology, Solid State Electronics, Electrum 229, S-16440 Kista-Stockholm, Sweden ; Svensson, B.G. ; Godey, S. ; Ntsoenzok, E.
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Platinum has been diffused into epitaxial n-type silicon at 600, 650, and 700 °C for 30 min following implantation with 3.3 MeV alpha particles. The doses employed were between 1×1011 and 1×1014He+ cm-2. Thereafter the samples were characterized using deep level transient spectroscopy (DLTS). The samples diffused at 700 °C show only the deep level at 0.23 eV below the conduction band that is attributed to substitutional platinum. DLTS profiling reveals a decoration of the region of maximal damage by the platinum for lower doses while for higher ones the platinum concentration is observed to decrease or vanish in this region. In addition, other deep levels may appear (so-called K lines). As the implantation dose increases, so does the platinum concentration following diffusion at 700 °C at the shallow end of the DLTS working region. It is shown that, by controlling the amount of implantation induced defects and the diffusion temperature, one can steer the amount of platinum that arrives in the region of maximal damage. © 1999 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:74 ,  Issue: 22 )

Date of Publication:

May 1999

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