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The thermal stability of nonstoichiometric carbon nitride films has been studied by x-ray absorption near edge spectroscopy. Amorphous carbon nitride thin films were annealed in vacuum up to 1150 °C revealing the presence of nitrogen in different bonding configurations. Annealing to 450 °C results in the loss of ∼50% of the nitrogen. The remaining nitrogen is bonded to carbon within a graphitic framework and it evolves into a more stable configuration with increasing temperature without significant N loss up to 820 °C. Beyond this temperature, nitrogen loss occurs without important structural changes. © 1999 American Institute of Physics.
Published in:
Applied Physics Letters
(Volume:74
,
Issue:
18
)
Date of Publication: May 1999
- Page(s):
- 2620 - 2622
- ISSN :
- 0003-6951
- Digital Object Identifier :
- 10.1063/1.123916
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 18 June 2009
- Issue Date :
- May 1999
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