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Browse Journals & Magazines > Applied Physics Letters ...> Volume:74 Issue:10 Help

Suppression of thermal interface degradation in (111) Si/SiO2 by noble gases

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3 Author(s)
Stesmans, A. ; Department of Physics, University of Leuven, 3001 Leuven, Belgium ; Afanasev, V.V. ; Revesz, A.G.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.123595 

Annealing-induced interface degradation of (111) Si/SiO2 has been studied in noble gas ambients. A remarkable impeding effect on degradation is found, inversely proportional to the gas atomic diameter. The noble gases physically obstruct SiO removal through their occupation of SiO accessible sites in the oxide, thus impeding degradation. The observed process represents blocking of a chemical reaction by physical action. © 1999 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:74 ,  Issue: 10 )

Date of Publication: Mar 1999

Page(s):
1466 - 1468
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.123595
Date of Current Version :
18 June 2009
Issue Date :
Mar 1999

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