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Browse Journals & Magazines > Applied Physics Letters ...> Volume:73 Issue:8 Help

Correlation between in situ optical emission spectroscopy in a reactive Ar/O2 rf magnetron sputtering discharge and Pb(ZrxTi1-x)O3 thin film composition

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5 Author(s)
Ayguavives, F. ; Laboratoire d’Etude des Matériaux en Films Minces, Université de Paris Sud, Plateau du Moulon, 91400 Orsay, France ; Ea-kim, B. ; Aubert, P. ; Agius, B.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.122072 

Lead zirconate titanate Pb(ZrxTi1-x)O3 (PZT) thin films have been deposited by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4Ti0.6) in a reactive argon/oxygen gas mixture. During plasma deposition, in situ optical emission spectroscopy measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities Zr—386.4 nm, Ti—399.9 nm, Pb—405.8 nm, and O—777.2 nm and the thin-film composition determined by a simultaneous use of Rutherford backscattering spectroscopy and nuclear reaction analysis. © 1998 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:73 ,  Issue: 8 )

Date of Publication: Aug 1998

Page(s):
1023 - 1025
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.122072
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Aug 1998

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