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Improved steady-state photocarrier grating in nanocrystalline thin films after surface-roughness reduction by mechanical polishing

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1 Author(s)
Bruggemann, R. ; Fachbereich Physik, Carl von Ossietzky Universität Oldenburg, D-26111 Oldenburg, GermanyInstitut für Physikalische Elektronik, Universität Stuttgart, Pfaffenwaldring 47, D-70569 Stuttgart, Germany

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.121913 

We detect elastic optical scattering resulting from the surface roughness of nanocrystalline silicon by a poor optical grating in the steady-state photocarrier grating experiment. The small variation of the experimental sampling function reduces the reliability of the ambipolar diffusion length measurements in this case. We demonstrate that the reduction in surface roughness of nanocrystalline silicon by polishing reduces optical scattering, improves the grating quality, and allows a reliable determination of the ambipolar diffusion length, making the experiment attractive for characterizing nanocrystalline silicon and other semiconductors which exhibit optical scattering. © 1998 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:73 ,  Issue: 4 )

Date of Publication:

Jul 1998

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