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Highly efficient electron emission from diode-type plane emitters using chemical-vapor-deposited single-crystalline diamond

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3 Author(s)
Ito, Toshimichi ; Department of Electrical Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan ; Nishimura, Masaki ; Hatta, Akimitsu

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.122879 

A highly efficient electron emitting diode with a flat emission surface has been fabricated using a 600 nm single-crystalline diamond film homoepitaxially grown on high-pressure synthesized (100) diamond by means of chemical-vapor deposition and ion-implantation techniques. The emitter contains a buried injection electrode layer and a hydrogenated diamond surface. When driving voltages ranging from 0.3 to 1.1 kV were applied between them, very efficient electron emissions were observed. The emission efficiency, defined as the ratio of the emission current to the injection diode current, reached 100% for emission currents on the order of 10-7A and did not significantly depend on the currents. © 1998 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:73 ,  Issue: 25 )

Date of Publication: Dec 1998

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