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Erratum: “Carbon nanotube tipped atomic force microscopy for measurement of ≪100 nm etch morphology on semiconductors” [Appl. Phys. Lett. 73, 529 (1998)]

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10 Author(s)
Nagy, G. ; Microelectronics Sciences Laboratories, Columbia University, New York, New York 10027 ; Levy, M. ; Scarmozzino, R. ; Osgood, R. M.
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Applied Physics Letters  (Volume:73 ,  Issue: 10 )