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Observation of Si cluster formation in SiO2 films through annealing process using x-ray photoelectron spectroscopy and infrared techniques

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7 Author(s)
Furukawa, Katsuhiko ; Advanced Science and Technology Center for Cooperative Research, Kyushu University, Kasuga, Fukuoka 816, Japan ; Liu, Yichun ; Nakashima, Hiroshi ; Gao, Dawei
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SiO2 films having high breakdown characteristics were deposited by a sputtering-type electron cyclotron resonance microwave plasma at room temperature. As-deposited films were annealed in an Ar ambient at temperatures ranging from 450 to 1000 °C. Transmitted infrared (IR) absorption and x-ray photoelectron spectroscopy (XPS) were used to characterize the as-deposited and annealed films. XPS measurements indicated that the as-deposited films had an approximately stoichiometric composition containing a few intermediate SiOx(x≠2) species and Ar atoms around some dangling-bond defects. The dependence of XPS spectra on annealing temperature showed that steep diffusion of the Ar atoms occurs at annealing temperatures of 450–550 °C and the SiOx species separate into SiO2 phase and Si clusters by an annealing process of 750–950 °C. Based on the full width at half-maximum variations of Si 2p XPS spectra and Si–O stretching mode of IR spectra for the annealed films, we discuss the Si cluster formation in SiO2 films through the annealing process. © 1998 American Institute of Physics.

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Applied Physics Letters  (Volume:72 ,  Issue: 6 )