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Browse Journals & Magazines > Applied Physics Letters ...> Volume:72 Issue:24 Help

High-resolution imaging of contact potential difference with ultrahigh vacuum noncontact atomic force microscope

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2 Author(s)
Kitamura, Shinichi ; JEOL Ltd., 1-2 Musashino 3-chome, Akishima, Tokyo 196, Japan ; Iwatsuki, Masashi

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.121577 

An ultrahigh vacuum scanning Kelvin probe force microscope (UHV SKPM) utilizing the gradient of electrostatic force, was developed based on an ultrahigh vacuum noncontact atomic force microscope (NC-AFM) capable of atomic level imaging, and used for simultaneous observation of contact potential difference (CPD) and NC-AFM images. CPD images of a Si(111) surface with Au deposited, clearly showed the potential difference in phases between 7×7 and 5×2 structures. When Ag was deposited as a submonolayer on the Si(111) 7×7 reconstructed surface, the atomic level lateral resolution was observed in CPD images as well as in NC-AFM topographic images. © 1998 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:72 ,  Issue: 24 )

Date of Publication: Jun 1998

Page(s):
3154 - 3156
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.121577
Date of Current Version :
18 June 2009
Issue Date :
Jun 1998

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