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Mechanisms for O2 dissociation during pulsed-laser ablation and deposition

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5 Author(s)
Camposeo, A. ; Istituto Nazionale per la Fisica della Materia, Dipartimento di Fisica, Università di Pisa, Via Buonarroti 2, I-56127 Pisa, Italy ; Cervelli, F. ; Fuso, F. ; Allegrini, M.
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We investigate different dissociation mechanisms for O2 gas during pulsed-laser ablation and deposition. Mesaurements are carried out by using an in situ diagnostics based on absorption spectroscopy of oxygen gas, with space- and time-resolved capabilities, during laser ablation of a metal alloy target in the presence of an oxygen environment. Data, analyzed as a function of ablation parameters, indicate that two different mechanisms, involving electron collisions and formation of a high-density, high-temperature shock layer, play an important role in producing atomic oxygen which can subsequently react with the ablated species. © 2001 American Institute of Physics.

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Applied Physics Letters  (Volume:78 ,  Issue: 16 )