Cart (Loading....) | Create Account
Close category search window

Highly sensitive time-of-flight secondary-ion mass spectroscopy for contaminant analysis of semiconductor surface using cluster impact ionization

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Hirata, K. ; National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan ; Saitoh, Y. ; Chiba, A. ; Narumi, K.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

To compare emission yields of secondary ions from contaminated silicon wafers between cluster and monoatomic ion impacts, pulsed C1+ and C8+ beams are applied to time-of-flight secondary-ion mass spectrometry. C8+ impact of 0.5 MeV/atom provides higher secondary-ion emission yields per incident atom than C1+ impact of 0.5 MeV/atom for organic and metallic contaminants. Higher peak intensities are also observed for a C8+ ion beam with a reduced energy. The enhanced emission yields of secondary ions originating from the contaminants show that mass spectrometry with cluster impact ionization is a powerful analytical tool for highly sensitive detection of the surface contaminants on the silicon wafers.

Published in:

Applied Physics Letters  (Volume:86 ,  Issue: 4 )

Date of Publication:

Jan 2005

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.