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Microstructure of sputtered TiN on Al

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5 Author(s)
Eaglesham, D.J. ; Bell Laboratories, Lucent Technologies, Murray Hill, New Jersey 07974 ; Bower, J.E. ; Marcus, M.A. ; Gross, M.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.119525 

We use electron microscopy and x-ray diffraction to study the microstructure of TiN deposited on Al. In contrast to previous work, we show that the TiN has a large (≈1 μm) grain size arising from its epitaxial orientation on the underlying Al. Within a single grain, the TiN has a heavily voided columnar structure that closely mimics the appearance of fine grains. The within-grain columnar structure arises from the usual shadowing mechanism for sputtered films, and has a weak dependence on the deposition temperature. © 1997 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:71 ,  Issue: 2 )

Date of Publication:

Jul 1997

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