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Semiconductor quantum point contact fabricated by lithography with an atomic force microscope

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5 Author(s)
Held, R. ; Solid State Physics Laboratory ETH Zürich, 8093 Zürich, Switzerland ; Heinzel, T. ; Studerus, P. ; Ensslin, K.
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We report on the experimental realization of a quantum point contact in a semiconductor heterostructure by lithography with an atomic force microscope (AFM). A thin, homogeneous titanium film on top of the chip surface was patterned by local anodic oxidation, induced by a current applied to an n-doped AFM tip. We demonstrate that self-aligned gate structures in the sub-micron regime can be fabricated with this technique. © 1997 American Institute of Physics.

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Applied Physics Letters  (Volume:71 ,  Issue: 18 )