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Using soft lithography to fabricate GaAs/AlGaAs heterostructure field effect transistors

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7 Author(s)
Hu, Junmin ; Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138 ; Beck, R.G. ; Deng, Tao ; Westervelt, R.M.
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This letter describes the fabrication of functional GaAs/AlGaAs field effect transistors using micromolding in capillaries—a representative soft lithographic technique. The fabrication process involved three soft lithographic steps and two registration steps. Room temperature characteristics of these transistors resemble those of field effect transistors fabricated by photolithography. The fabrication of functional microelectronic devices using multilayer soft lithography establishes the compatibility of these techniques with the processing methods used in device fabrication, and opens the door for their development as a technique in this area. © 1997 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:71 ,  Issue: 14 )

Date of Publication:

Oct 1997

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