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A spatially resolved optical emission sensor for plasma etch monitoring

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4 Author(s)
Shannon, Steven ; Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109 ; Holloway, J.P. ; Flippo, K. ; Brake, M.L.

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A spatially resolved optical emission spectroscopy sensor has been developed, and the resulting reconstructed radial emission profiles from an ArI and ArII line compare well with Ar sputter etch uniformity profiles. The new sensor collects light from a wedge shaped field of view, and is rotated around a single collection point in order to observe the entire plasma through a relatively small viewpoint. © 1997 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:71 ,  Issue: 11 )