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The formation of nanostructures on silicon surfaces in the presence of hydrogen

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3 Author(s)
Teschke, O. ; UNICAMP/IFGW, 13081-970 Campinas, SP, Brazil ; Soares, D.M. ; Nunes, L.A.O.

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The presence of hydrogen in HF solutions at a silicon substrate surface is shown to be sufficient to produce a photoluminescent porous silicon layer. The photoluminescence measurements of bubbled and anodized samples show similar spectra when illuminated with UV radiation. This is strong evidence that the hydrogen produced by the anodic silicon dissolution reaction is also responsible for the formation of nanostructures. © 1997 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:70 ,  Issue: 21 )

Date of Publication: May 1997

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