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Electron transport properties through InAs self-assembled quantum dots in modulation doped structures

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4 Author(s)
Horiguchi, N. ; Fujitsu Laboratories Ltd., 10-1 Morinosato-Wakamiya, Atsugi, 243-01, Japan ; Futatsugi, T. ; Nakata, Y. ; Yokoyama, N.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.118840 

We report electron transport properties through InAs self-assembled quantum dots in a modulation-doped structure with split gates. We observed drain current modulation with respect to gate voltage due to electron transport through the quantum level of InAs dots. The energy gaps estimated from the temperature dependence study of valley current and the voltage difference between the drain current peaks were consistent with each other and as large as 14 meV. The energy gaps can be explained by the charging energy of the InAs dots. © 1997 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:70 ,  Issue: 17 )

Date of Publication: Apr 1997

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