Cart (Loading....) | Create Account
Close category search window
 

Real time control of plasma deposited multilayers by multiwavelength ellipsometry

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Kildemo, M. ; Laboratoire de Physique des Interfaces et des Couches Minces (UPR 258 du CNRS), Ecole Polytechnique, 91128 Palaiseau, France ; Bulkin, P. ; Deniau, S. ; Drevillon, B.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.116515 

A robust direct method for real time control, by multiwavelength phase modulated ellipsometry (PME), of the growth of plasma deposited structures is presented here. Transparent multilayers consisting of SiO2 and SiNx alloys are investigated. This feedback control method is based on the comparison between the real time PME measurements and precomputed target trajectories. It can provide the high precision required to deposit high performance optical coatings. In particular an overall accuracy better than 1% is obtained on a fifteen layer quarter‐wave filter, designed at 670 nm. This real time procedure, which is not limited to transparent materials nor plasma processes, appears to be a useful tool for process control. © 1996 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:68 ,  Issue: 24 )

Date of Publication:

Jun 1996

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.