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Low energy ion beam mixing as a tool for multilayer x‐ray mirror fabrication

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5 Author(s)
Schlatmann, R. ; FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands ; Keppel, A. ; Bultman, S. ; Weber, T.
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We present low energy ion beam mixing as a tool for the fabrication of composite layers with smooth interfaces. Using this tool we make a stack of alternating layers of Si and MoxSiy. We measure composition and interfacial roughness (σ) and find x/y≊5/3 and σ≊4 Å. The method can be applied to reduce absorption losses in x‐ray multilayer mirrors for high‐resolution dispersive purposes, and to increase thermal stability of multilayers. The thickness of the mixed layers is found to be equal to the ion range. © 1996 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:68 ,  Issue: 21 )

Date of Publication:

May 1996

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