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Browse Journals & Magazines > Applied Physics Letters ...> Volume:68 Issue:21 Help

Low energy ion beam mixing as a tool for multilayer x‐ray mirror fabrication

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5 Author(s)
Schlatmann, R. ; FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands ; Keppel, A. ; Bultman, S. ; Weber, T.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.116364 

We present low energy ion beam mixing as a tool for the fabrication of composite layers with smooth interfaces. Using this tool we make a stack of alternating layers of Si and MoxSiy. We measure composition and interfacial roughness (σ) and find x/y≊5/3 and σ≊4 Å. The method can be applied to reduce absorption losses in x‐ray multilayer mirrors for high‐resolution dispersive purposes, and to increase thermal stability of multilayers. The thickness of the mixed layers is found to be equal to the ion range. © 1996 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:68 ,  Issue: 21 )

Date of Publication: May 1996

Page(s):
2948 - 2950
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.116364
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
May 1996

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