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Epitaxial growth of lithium niobate thin films from a single‐source organometallic precursor using metalorganic chemical vapor deposition

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4 Author(s)
Wernberg, Alex A. ; Corporate Research Laboratories, Eastman Kodak Company, Rochester, New York 14650‐2011 ; Gysling, Henry J. ; Filo, Albert J. ; Blanton, Thomas N.

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Lithium niobate thin films were deposited on (0001) sapphire using metalorganic chemical vapor deposition. An organometallic compound, formed by reaction of lithium dipivaloylmethanate and niobium(V) ethoxide, was used as a single‐source precursor. The epitaxial nature of the films was established by x‐ray diffraction and Rutherford backscattering analyses (RBS).

Published in:

Applied Physics Letters  (Volume:62 ,  Issue: 9 )

Date of Publication:

Mar 1993

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