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Cobalt self‐diffusion during cobalt silicide growth

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3 Author(s)
Diale, M. ; Physics Department, Medunsa, Medunsa 0204, South Africa ; Challens, C. ; Zingu, E.C.

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The flux of atoms during Si/Co interdiffusion has been investigated by means of thin tantalum marker layers imbedded in the deposited Co layer. The silicide phase CoSi is found to grow in the Si/CoSi/Co structure without any conversion of CoSi to Co2Si. Cobalt is found to be the dominant diffusing species in CoSi during its growth in Si/CoSi/Co structures. Cobalt atoms are also found to diffuse in the unreacted Co layer from the Co surface towards the CoSi/Co interface. These results present evidence that some of the Co vacancies in the metal silicide layer are annihilated at the Co surface.

Published in:

Applied Physics Letters  (Volume:62 ,  Issue: 9 )