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Formation of P precipitates during annealing of InP grown by gas source molecular beam epitaxy at low temperature

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3 Author(s)
Claverie, A. ; Centre d’Elaboration des Matériaux et d’Etudes Structurales, CNRS, BP 4347 Toulouse, France ; Crestou, J. ; Garcia, J.C.

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We have studied by transmission electron microscopy the structural changes that take place in monocrystalline InP grown by gas source molecular beam epitaxy at low temperature upon annealing at about 600 °C. It is shown that the partial relaxation of the crystal which is observed by x rays is due to the formation of small precipitates (3–7 nm). Electron diffraction experiments show that the structure of these precipitates is cubic with a simple cube‐to‐cube orientation relationship with the substrate. Most probably, these precipitates are of alpha‐white cubic P which is known to be insulating.

Published in:
Applied Physics Letters  (Volume:62 ,  Issue: 14 )

Date of Publication: Apr 1993

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