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NF3 plasma generation by commercial 50 Hz alternating current discharge for dry etching

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2 Author(s)
Konuma, M. ; Max‐Planck‐Institut für Festkörperforschung, Heisenbergstrasse 1, 7000 Stuttgart 80, Germany ; Bauser, E.

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We generate NF3 plasma for the first time by commercial 50 Hz ac discharge. Mass and energy analysis of the plasma shows the predominant positive ion NF2+, followed by the NF3+ parent ion, NF+, and F+. The measured energy distribution of the ions corresponds to the energy distribution expected from the time dependent plasma potential in a 50 Hz discharge. The plasma can be applied for native oxide removal from Si substrates.

Published in:

Applied Physics Letters  (Volume:61 ,  Issue: 18 )

Date of Publication:

Nov 1992

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