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Beam profile reflectometry: A new technique for dielectric film measurements

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5 Author(s)
Rosencwaig, Allan ; Therma‐Wave, Inc., Fremont, California 94539 ; Opsal, Jon ; Willenborg, D.L. ; Kelso, S.M.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.107323 

We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 Å and as thick as 20 000 Å. The technique is also capable of simultaneous 2 and 3 parameter measurements and it performs all measurements with a submicron spot size.

Published in:

Applied Physics Letters  (Volume:60 ,  Issue: 11 )

Date of Publication:

Mar 1992

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