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We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 Å and as thick as 20 000 Å. The technique is also capable of simultaneous 2 and 3 parameter measurements and it performs all measurements with a submicron spot size.
Published in:
Applied Physics Letters
(Volume:60
,
Issue:
11
)
Date of Publication: Mar 1992
- Page(s):
- 1301 - 1303
- ISSN :
- 0003-6951
- Digital Object Identifier :
- 10.1063/1.107323
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 18 June 2009
- Issue Date :
- Mar 1992
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