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Low-divergence coherent soft x-ray source at 13 nm by high-order harmonics

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3 Author(s)
Takahashi, E.J. ; Laser Technology Laboratory, RIKEN, 2-1 Hirosawa, Wako, Saitama 3510198, Japan ; Nabekawa, Y. ; Midorikawa, K.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1637949 

We have generated a few tens of nanojoules of coherent soft x-ray pulses at a wavelength around 13 nm with high-order harmonics. Output energy was estimated to be 25 nJ/pulse at the 59th harmonic (13.5 nm), and the beam divergence was measured to be 0.35 mrad full width at half maximum. Since a Mo/Si mirror covers two harmonics in the high reflectivity region, we can use ∼50 nJ harmonic energy per pulse in the 13 nm wavelength. This high-coherent low-emittance x-ray source is useful for the characterization and inspection of an optical system for extreme-ultraviolet lithography. © 2004 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:84 ,  Issue: 1 )

Date of Publication: Jan 2004

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