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Epitaxial growth of NaxCoO2 thin films by pulsed-laser deposition

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7 Author(s)
Krockenberger, Y. ; Max-Planck-Institut für Festkörperforschung, Heisenbergstraße 1, D-70569 Stuttgart, Germany ; Fritsch, I. ; Cristiani, G. ; Matveev, A.
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Single-phase thin films of NaxCoO2 have been grown epitaxially by pulsed-laser deposition technique. The growth conditions were studied based on the log pO2-1/T phase diagram of CoO2 using different types of substrate materials. For Na0.58CoO2, metallic behavior is found down to 4.2 K.

Published in:

Applied Physics Letters  (Volume:86 ,  Issue: 19 )