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Browse Journals & Magazines > Applied Physics Letters ...> Volume:86 Issue:19 Help

Epitaxial growth of NaxCoO2 thin films by pulsed-laser deposition

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7 Author(s)
Krockenberger, Y. ; Max-Planck-Institut für Festkörperforschung, Heisenbergstraße 1, D-70569 Stuttgart, Germany ; Fritsch, I. ; Cristiani, G. ; Matveev, A.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1927272 

Single-phase thin films of NaxCoO2 have been grown epitaxially by pulsed-laser deposition technique. The growth conditions were studied based on the log pO2-1/T phase diagram of Co–O2 using different types of substrate materials. For Na0.58CoO2, metallic behavior is found down to 4.2 K.

Published in:
Applied Physics Letters  (Volume:86 ,  Issue: 19 )

Date of Publication: May 2005

Page(s):
191913 - 191913-3
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.1927272
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
May 2005

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