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Browse Journals & Magazines > Applied Physics Letters ...> Volume:85 Issue:21 Help

Production of high-density capacitively coupled radio-frequency discharge plasma by high-secondary-electron-emission oxide

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2 Author(s)
Ohtsu, Yasunori ; Department of Electrical and Electronic Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan ; Fujita, Hiroharu

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1827353 

High-density capacitively coupled radio-frequency plasma with electron density ne≫1010 cm-3 was produced using MgO electrodes with a high secondary-electron-emission coefficient. It was found that in the case of MgO electrodes, both plasma density and optical emission intensity were about one order of magnitude higher than those in the case of Al electrodes.

Published in:
Applied Physics Letters  (Volume:85 ,  Issue: 21 )

Date of Publication: Nov 2004

Page(s):
4875 - 4877
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.1827353
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Nov 2004

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