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Thin biaxially textured TiN films on amorphous substrates prepared by ion-beam assisted pulsed laser deposition

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3 Author(s)
Huhne, R. ; Institute for Metallic Materials, IFW Dresden, Helmholtzstrasse 20, 01069 Dresden, Germany ; Fahler, S. ; Holzapfel, B.

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Thin TiN films have been grown using reactive ion-beam assisted pulsed laser deposition. The texture development was in situ analyzed using reflection high-energy electron diffraction. Above 300 °C a sharp cube textured nucleation layer is observed using an ion beam with energies above 400 eV under an angle of 45° relative to the substrate normal. The cube texture is not stable during further ion-beam assisted growth but can be preserved using homoepitaxial growth. Resulting films showed an in-plane orientation of about 13°. The texture development can be described in terms of energy considerations and anisotropic sputter rates.

Published in:

Applied Physics Letters  (Volume:85 ,  Issue: 14 )

Date of Publication:

Oct 2004

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