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High-spatial-resolution scanning capacitance microscope using all-metal probe with quartz tuning fork

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2 Author(s)
Naitou, Yuichi ; Silicon Systems Research Laboratories, NEC Corporation, 1120, Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan ; Ookubo, Norio

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1791342 

The scanning capacitance microscope (SCM) reported here uses a frequency modulation (FM) technique to control the distance between the sample and an all-metal probe. The probe was attached to a quartz tuning fork in a configuration minimizing the perturbation due to the probe. The FM-SCM yields two images of ∂C/∂V and ∂C/∂Z signals, where C is capacitance sensed by the probe, Z the probe–sample distance, and V a bias voltage, respectively. On a cross section of a field effect transistor, the two-dimensional p–n junction locus was observed with a spatial resolution better than 5 nm in the ∂C/∂V image. The ∂C/∂Z images of polysilicon gate electrodes and highly doped source/drain regions have higher contrast than the ∂C/∂V images.

Published in:
Applied Physics Letters  (Volume:85 ,  Issue: 11 )

Date of Publication: Sep 2004

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