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Fabrication of three-dimensional photonic crystals using silicon micromachining

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5 Author(s)
Venkataraman, Sriram ; Department of Electrical and Computer Engineering, University of Delaware, 140 Evans Hall, Newark, Delaware 19716 ; Schneider, G.J. ; Murakowski, J. ; Shouyuan Shi
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1790594 

We propose a method for the fabrication of three-dimensional photonic-crystal structures using conventional planar silicon micromachining. The method utilizes a single planar etch mask coupled with time-multiplexed, sidewall-passivating, deep anisotropic reactive-ion etching, to create an array of spherical voids with three-dimensional symmetry. Preliminary results are presented that demonstrate the feasibility of the approach.

Published in:

Applied Physics Letters  (Volume:85 ,  Issue: 11 )

Date of Publication:

Sep 2004

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