High-quality screen-printed contacts were achieved on a high-sheet-resistance emitter (∼100 Ω/sq.) using PV168 Ag paste and rapid co-firing in the belt furnace. The optimized co-firing cycle developed for a 100 Ω/sq. emitter produced 16.1% efficient 4 cm2 planar edge-defined film-fed grown (EFG) ribbon Si cells with a low series-resistance (0.8 Ω cm2), high fill factor of ∼0.77, along with very significant bulk lifetime enhancement from 3 to 100 μs. This represents the highest-efficiency screen-printed EFG Si cells with single-layer antireflection (AR) coating. These cells were fabricated using a simple process involving POCl3 diffusion for a high-sheet-resistance emitter, SiNx AR coating and rapid cofiring of Ag grid and Al-doped back-surface field in a conventional belt furnace. The rapid cofiring process also prevented junction shunting while maintaining very effective SiNx-induced hydrogen passivation of defects, resulting in an average bulk lifetime exceeding 100 μs. © 2004 American Institute of Physics.
Published in:
Applied Physics Letters
(Volume:84
,
Issue:
17
)
Date of Publication:
Apr 2004
- Page(s):
-
3409
-
3411
- ISSN :
-
0003-6951
- Digital Object Identifier :
-
10.1063/1.1737069
- Product Type:
-
Journals & Magazines
- Date of Current Version :
-
18 June 2009
- Issue Date :
-
Apr 2004