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Site-selective silicon adatom desorption using femtosecond laser pulse pairs and scanning tunneling microscopy

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5 Author(s)
Futaba, D.N. ; Department of Applied Physics, CREST, Japan Science and Technology Corporation (JST), Hokkaido University, Sapporo 060-8628, Japan ; Morita, R. ; Yamashita, M. ; Tomiyama, S.
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We performed an experimental study of silicon adatom desorption from the Si(111)-7×7 surface using femtosecond laser pulse pair excitation with 80 fs pulse duration, 800 nm center wavelength, 300 mW average power, and a 100 MHz repetition rate. Using scanning tunneling microscopy, we directly recorded the desorption characteristics at each delay setting for each of the four adatom binding sites. The study revealed a preferential dependence between the delay time and the adatom sites within a 66.6–1000 fs delay range. © 2003 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:83 ,  Issue: 12 )

Date of Publication: Sep 2003

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