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Mesoscale x-ray diffraction measurement of stress relaxation associated with buckling in compressed thin films

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4 Author(s)
Goudeau, Philippe ; Laboratoire de Métallurgie Physique, UMR 6630 CNRS, Université de Poitiers, SP2MI, Bvd Marie et Pierre Curie, 86962 Futuroscope Chasseneuil, France ; Villain, Pascale ; Tamura, N. ; Padmore, Howard A.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1591081 

Compressed thin films deposited on substrates may buckle depending on the geometrical and mechanical properties of the film/substrate set. Until recently, the small dimensions of the buckling have prevented measurements of their local in plane internal stress distribution. Using a scanning x-ray microdiffraction technique developed at a third generation x-ray synchrotron source, we obtained thin film internal stress maps for circular blisters and telephone chord buckling with micrometric spatial resolution. A fair agreement was found between the film delamination topology observed by optical microscopy and the measured stress maps. We evidenced residual stress relaxation associated with the film buckling: the top is essentially stress free while adherent region exhibits large compressive stresses. © 2003 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:83 ,  Issue: 1 )

Date of Publication:

Jul 2003

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