By Topic

Direct molding of nanopatterned polymeric films: Resolution and errors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Azzaroni, O. ; Instituto de Investigaciones Fisicoquı´micas Teóricas y Aplicadas, Universidad Nacional de La Plata, CONICET, Casilla de Correo 16, Sucursal 4 (1900) La Plata, Argentina ; Schilardi, P.L. ; Salvarezza, R.C. ; Gago, R.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1537867 

The capability of the direct polymer molding method to transfer ordered nanopatterns from a surface-modified silicon template to polymeric materials, such as polystyrene (PS) and high-impact polystyrene (HIPS) is investigated by tapping mode atomic force microscopy (AFM). The lateral resolution of the method for both materials is 54±1 nm while the vertical resolution is 5±1 nm and 3±1 nm, for PS and HIPS, respectively. This difference is explained by considering the different nanomechanical properties of the polymers. In contrast, HIPS surfaces are more resistant to the wear induced by the repetitive “reading” of the surface structure with the AFM tip. © 2003 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:82 ,  Issue: 3 )