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Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold

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6 Author(s)
McClelland, Gary M. ; IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099 ; Hart, Mark W. ; Rettner, C.T. ; Best, Margaret E.
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A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of SiO2 pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching SiO2, yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently. © 2002 American Institute of Physics.

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Applied Physics Letters  (Volume:81 ,  Issue: 8 )