By Topic

Optical waveguides fabricated by pulsed-laser deposition of SiO2 films with different refractive indices

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Okoshi, M. ; Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka 239-8686, Japan ; Kuramatsu, M. ; Inoue, N.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1496134 

We deposited pure SiO2 films with different refractive indices by pulsed-laser deposition with silicone targets. The refractive index of the films could be controlled by the deposition rate. Lowering of the deposition rate helped to make a dense film, showing higher refractive index. A 0.4-μm-thick SiO2 cladding film deposited at 0.1 nm/pulse was first formed on the whole surface of a Si wafer, and then a 1-μm-thick SiO2 core film at 0.05 nm/pulse was fabricated in a line on the sample. The sample functioned as an optical waveguide for a 633 nm line of He–Ne laser. © 2002 American Institute of Physics.

Published in:

Applied Physics Letters  (Volume:81 ,  Issue: 5 )