We deposited pure SiO2 films with different refractive indices by pulsed-laser deposition with silicone targets. The refractive index of the films could be controlled by the deposition rate. Lowering of the deposition rate helped to make a dense film, showing higher refractive index. A 0.4-μm-thick SiO2 cladding film deposited at 0.1 nm/pulse was first formed on the whole surface of a Si wafer, and then a 1-μm-thick SiO2 core film at 0.05 nm/pulse was fabricated in a line on the sample. The sample functioned as an optical waveguide for a 633 nm line of He–Ne laser. © 2002 American Institute of Physics.