Close category search window
 

Dielectric relaxation studies of Bi-doping effects on the oxygen-ion diffusion in La2-xBixMo2O9 oxide-ion conductors

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Wang, X.P. ; Key Laboratory of Internal Friction and Defects in Solids, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031, People’s Republic of China ; Fang, Q.F. ; Li, Z.S. ; Zhang, G.G.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1518151 

Two dielectric relaxation peaks associated with oxygen-ion diffusion in the oxide-ion conductors La2-xBixMo2O9 (x=0.05, 0.1, and 0.15) have been studied. It is found that the activation energies of the two peaks increase with increasing Bi-doping concentration, which results from the blocking effects of the lone-pair electrons of Bi3+ ions. From the different effects of Bi doping on the two peaks, the diffusion paths of oxygen ions corresponding to each peak are confirmed. Significantly, it is revealed that Bi doping could enhance the ionic conductivity of La2Mo2O9 at lower temperatures. © 2002 American Institute of Physics.

Published in:
Applied Physics Letters  (Volume:81 ,  Issue: 18 )

Date of Publication: Oct 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.