Cart (Loading....) | Create Account
Close category search window

Etching characteristics of Si1-xGex alloy in ammoniac wet cleaning

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Koyama, Kazuhisa ; Microelectronics Research Laboratories, NEC Corporation, Miyazaki 4‐1‐1, Miyamae‐ku, Kawasaki 213, Japan ; Hiroi, Masayuki ; Tatsumi, T. ; Hirayama, Hiroyuki

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Etching characteristics of Si1-xGex alloys in ammoniac wet cleaning (RCA cleaning) were examined. The etching rate of Si1-xGex became larger with increasing Ge ratio (X). Temperature dependence of the etching rate was studied and the etching rate was large at high temperatures. However, no obvious difference was observed in the temperature dependence of Si1-xGex etching rate at different Ge ratio (X). A surface morhology degradation after RCA cleaning was observed at high Ge ratio (X). A stoichiometry change of Si1-xGex surface after RCA cleaning was observed by x‐ray photoelectron spectroscopy (XPS). The etching rate increase and the surface morphology degradation are thought to be due to the rapid etching of Ge atoms at the top surface layer.

Published in:

Applied Physics Letters  (Volume:57 ,  Issue: 21 )

Date of Publication:

Nov 1990

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.