Cart (Loading....) | Create Account
Close category search window
 

Transmission electron microscopy and photoluminescence study of silicon and boron ion implanted GaAs/GaAlAs quantum wells

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Arakawa, Y. ; California Institute of Technology, Pasadena, California 91125 ; Smith, J.S. ; Yariv, A. ; Otsuka, N.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.97829 

Transmission electron microscopy (TEM) and photoluminescence (PL) data are presented on GaAs/Ga0.25Al0.75As quantum well (QW) structures grown by molecular beam epitaxy which were implanted with B ions and Si ions, respectively, to a dose of 1015 cm-2. TEM observations reveal that significant intermixing of the layers occurs in Si implanted QW structures at a depth well beyond the projected range of the implanted ion after 1 h thermal annealing at 850 °C. A subsequent 2‐h annealing causes mixing near the surface, while the unmixed region still remains at a distance twice the projection range. In contrast, intermixing was not observed in annealed B implanted QW structures, which suggests a strong dependence of alloy mixing effects on the impurity. PL data support these results.

Published in:

Applied Physics Letters  (Volume:50 ,  Issue: 2 )

Date of Publication:

Jan 1987

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.