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Modification of Y2Ba4Cu8O16 thin‐film surfaces by interaction with a radio frequency excited oxygen plasma

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2 Author(s)
Budhani, R.C. ; Department of Applied Science, Brookhaven National Laboratory, Upton, New York 11973 ; Ruckman, M.W.

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The use of rf excited oxygen plasma for oxidizing and possible etching of SrTiO3 (100) supported Y2Ba4Cu8O16 thin films is studied by photoemission. Oxygen plasma modifies the surface and eliminates photoemission features identified with surface impurities like BaCO3. The resulting surface is barium deficient but shows a Fermi level suggesting it is metallic. Application of a -200 V dc bias to the sample to increase the kinetic energy of the incident oxygen ions enhances either surface sputtering or atomic mixing and produces a surface which resembles YBa2Cu3O7, because the photoemission spectra are similar to those published for cleaved crystal surfaces or films.

Published in:

Applied Physics Letters  (Volume:55 ,  Issue: 22 )