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Boundaries between different antiphase domains have been unambiguously identified in heteroepitaxial GaAs on silicon substrates by transmission electron microscopy. A simple and reliable method is described for assessing the presence or absence of these domain boundaries in GaAs. The domain size was found to be as small as ∼0.1 μm in GaAs that had been grown on nominal Si(001) in which a buried, implanted oxide had been previously formed. These boundaries are expected to degrade electrical performance and device reliability modify electronic transport and degrade device performance.