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Device fabrication by nanolithography and electroplating for magnetic flux quantization measurements

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4 Author(s)
Kratschmer, E. ; Institute of Semiconductor Electronics, Technical University Aachen, Sommerfeldstrasse, Seffent–Melaten, 5100 Aachen, Federal Republic of Germany ; Erko, A. ; Petrashov, V.T. ; Beneking, H.

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100‐keV e‐beam lithography and electroplating of gold have been used to fabricate a device for the measurement of quantum changes in magnetic flux. The structure is defined in a 200‐nm‐thick layer of a copolymer of methyl methacrylate and methacrylic acid (PMMA/MAA) on top of a Si wafer covered by 150 nm of Si3N4. The device is a square frame of 2×2 μm2 and 100‐nm linewidth. Gold was electroplated to a thickness of 100 nm. This technique allows the fabrication of high resolution, high aspect ratio gold structures.

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Applied Physics Letters  (Volume:44 ,  Issue: 10 )