Cart (Loading....) | Create Account
Close category search window
 

Formation kinetics of MoSi2 induced by cw scanned laser beam

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Bomchil, G. ; Centre National d’Etudes des Télécommunications, CNS, 38240, Meylan, France ; Bensahel, D. ; Golanski, A. ; Ferrieu, F.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.93323 

Scanned cw laser beams at different scan velocities from 10 to 400 cm/s have been used to study the interaction of thin metal films of molybdenum deposited by electron beam evaporation with single‐crystal silicon substrate. Backscattering technique has been used to investigate the growth mechanism of hexagonal silicide MoSi2 as a function of the number of repetitive laser scans. Silicide layers are found to grow at a rate proportional to the square root of the effective annealing time in the whole range of scan velocities. Effective annealing temperatures are calculated for each laser annealing condition, and from an Arrhenius plot a mean value of activation energy for MoSi2 growth is estimated.

Published in:

Applied Physics Letters  (Volume:41 ,  Issue: 1 )

Date of Publication:

Jul 1982

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.