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Double heteroepitaxy in the Si (111)/CoSi2/Si structure

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3 Author(s)
Saitoh, Shyuichi ; Graduate School of Science and Engineering, Tokyo Institute of Technology, Nagatsuda, Midoriku, Yokohama 227, Japan ; Ishiwara, Hiroshi ; Furukawa, S.

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Epitaxial growth of CoSi2 films on Si substrates and the growth of Si films on the Si(111)/CoSi2 structure are investigated. Solid phase epitaxy is used to grow both CoSi2 and Si films. Molecular beam epitaxy is also used to grow the top Si films in the double heteroepitaxy. It has been found that two dominant factors required to obtain good epitaxial films are substrate cleaning by lamp heating before the film deposition and annealing of the deposited films without exposure to air. Excellent crystalline quality of the CoSi2 films on (111) Si substrates and good quality of the Si films on the Si(111)/CoSi2 structure have been demonstrated by ion channeling and backscattering techniques and reflection electron diffraction analysis. Uniformity of the grown films has also been examined by scanning electron microscopy.

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Applied Physics Letters  (Volume:37 ,  Issue: 2 )