Cart (Loading....) | Create Account
Close category search window
 

Polycrystallization of pulsed laser deposited BaTiO3 thin films at room temperature by KrF laser annealing

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Tomita, Hiroyuki ; Dept. of Electr. Eng., Keio Univ., Yokohama, Japan ; Ninomiya, Yutaka ; Ito, Atsushi ; Obara, Minoru

It is necessary to establish the fabrication techniques of high quality BaTiO3 thin films. In the present work, the laser annealing technique was applied to crystallize amorphous BaTiO3 thin films deposited by KrTiO3 laser ablation at room temperature, and the effect of pulsed excimer laser annealing on BaTiO 3 thin films was investigated for the first time

Published in:

Lasers and Electro-Optics Society Annual Meeting, 1995. 8th Annual Meeting Conference Proceedings, Volume 1., IEEE  (Volume:1 )

Date of Conference:

30-31 Oct 1995

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.