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Summary form only given, as follows. Recent attention focusing on semiconductor processing emissions has required the development of analytical methodology for quantifying unused process gases, characterizing and quantifying process by-products, and determining the effectiveness of abatement equipment. Processes emitting Hazardous Air Pollutants (HAPS) and Perfluorinated Compounds (PFCs) have come under scrutiny because of their suspected contribution to environmental and health related problems. This paper described real-time analytical methodology which permits determination of unconsumed process gases and process by-products, and evaluation of abatement effectiveness. Data from state-of-the-art production facilities are presented to demonstrate the effectiveness of real-time analysis. Calibration methodology, which is critical for measurement accuracy, is also discussed. The benefits of performing process and effluent monitoring could be multifold, including cost-of-ownership reductions from increased throughput, increased hardware lifetime, scrubber use reduction, and decreased raw materials costs. Additionally, regulatory compliance issues can be dealt with from a quantitative rather than qualitative standpoint.