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Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography

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9 Author(s)
Shir, D. ; Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA ; Nelson, E.C. ; Chen, Y.C. ; Brzezinski, A.
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We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.

Published in:

Applied Physics Letters  (Volume:94 ,  Issue: 1 )